Effects of KrF laser irradiation on Bi nanoclusters embedded in a-SiO2 by ion implantation

Bismuth nanoclusters have been formed in optical grade silica glass (Corning 7940) by ion implantation which formed localized Bi:SiO2 composite in the near-surface region. Subsequent irradiation with 248 nm KrF excimer laser light modifies the distribution and chemical states of the implanted bismut...

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Bibliographic Details
Published in:Applied physics letters 1998-11, Vol.73 (18), p.2687-2689
Main Authors: Park, Seung Y., Isobe, Tetsuhiko, Senna, Mamoru, Weeks, Robert A., Zuhr, Raymond A.
Format: Article
Language:English
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Summary:Bismuth nanoclusters have been formed in optical grade silica glass (Corning 7940) by ion implantation which formed localized Bi:SiO2 composite in the near-surface region. Subsequent irradiation with 248 nm KrF excimer laser light modifies the distribution and chemical states of the implanted bismuth in the composite. Excimer laser irradiation causes not only photochemical reactions in the composite leaving a thin film of bismuth oxide on the surface, but also removal of the precipitated particles by both thermal and nonthermal desorption mechanisms from the surface.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.122554