Influence of target–substrate angle on the elemental concentration of c -axis YBa2Cu3O7−x thin films

The thermalization processes in sputtering suggest a spatial dependence of elemental concentration in the sputter plume. A variety of analysis techniques demonstrate that c-axis films grown at angles which deviate from the standard off-axis geometry produce nominally YBa2Cu3O7−x in the bulk with dra...

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Bibliographic Details
Published in:Applied physics letters 1999-09, Vol.75 (11), p.1589-1591
Main Authors: Pugel, D. E., Greene, L. H.
Format: Article
Language:English
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Summary:The thermalization processes in sputtering suggest a spatial dependence of elemental concentration in the sputter plume. A variety of analysis techniques demonstrate that c-axis films grown at angles which deviate from the standard off-axis geometry produce nominally YBa2Cu3O7−x in the bulk with dramatic changes in the surface morphology and deposition rate. In addition to the common materials characterization techniques of scanning electron microscopy, x-ray diffraction, transport measurements, and conventional Rutherford backscattering spectrometry (RBS), angle-dependent RBS is employed to probe surface inhomogeneities of films grown at target–substrate angles away from the standard off-axis position.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.124763