Influence of target–substrate angle on the elemental concentration of c -axis YBa2Cu3O7−x thin films

The thermalization processes in sputtering suggest a spatial dependence of elemental concentration in the sputter plume. A variety of analysis techniques demonstrate that c-axis films grown at angles which deviate from the standard off-axis geometry produce nominally YBa2Cu3O7−x in the bulk with dra...

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Published in:Applied physics letters 1999-09, Vol.75 (11), p.1589-1591
Main Authors: Pugel, D. E., Greene, L. H.
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Language:English
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cited_by cdi_FETCH-LOGICAL-c291t-b33689f49e759bdf7fd1f55643f1bcf9a33794ff1f9b34486c4f62e2a9763dc43
cites cdi_FETCH-LOGICAL-c291t-b33689f49e759bdf7fd1f55643f1bcf9a33794ff1f9b34486c4f62e2a9763dc43
container_end_page 1591
container_issue 11
container_start_page 1589
container_title Applied physics letters
container_volume 75
creator Pugel, D. E.
Greene, L. H.
description The thermalization processes in sputtering suggest a spatial dependence of elemental concentration in the sputter plume. A variety of analysis techniques demonstrate that c-axis films grown at angles which deviate from the standard off-axis geometry produce nominally YBa2Cu3O7−x in the bulk with dramatic changes in the surface morphology and deposition rate. In addition to the common materials characterization techniques of scanning electron microscopy, x-ray diffraction, transport measurements, and conventional Rutherford backscattering spectrometry (RBS), angle-dependent RBS is employed to probe surface inhomogeneities of films grown at target–substrate angles away from the standard off-axis position.
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fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1063_1_124763</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1063_1_124763</sourcerecordid><originalsourceid>FETCH-LOGICAL-c291t-b33689f49e759bdf7fd1f55643f1bcf9a33794ff1f9b34486c4f62e2a9763dc43</originalsourceid><addsrcrecordid>eNotkM1KAzEUhYMoWKvgI2TpZmru3EzSLLX4Uyh0owtXQybNbUemqUxSqDuXrvUN-ySm1NXhcs534RzGrkGMQCi8hRGUUis8YQMQWhcIMD5lAyEEFspUcM4uYnzPZ1UiDthqGqjb-uA83xBPtl_6tP_6jdsmpt4mz21YdtkLPK08951f-5Bsx90mI-EQabOXUccLu2sjf7u35WSLc73__tllqA2c2m4dL9kZ2S76q38dstfHh5fJczGbP00nd7PClQZS0SCqsSFpvK5MsyBNC6CqUhIJGkfGImojiYBMg1KOlZOkSl9akzsvnMQhuzn-df0mxt5T_dG3a9t_1iDqw0I11MeF8A9zCVpw</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Influence of target–substrate angle on the elemental concentration of c -axis YBa2Cu3O7−x thin films</title><source>American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list)</source><source>AIP_美国物理联合会现刊（与NSTL共建）</source><creator>Pugel, D. E. ; Greene, L. H.</creator><creatorcontrib>Pugel, D. E. ; Greene, L. H.</creatorcontrib><description>The thermalization processes in sputtering suggest a spatial dependence of elemental concentration in the sputter plume. A variety of analysis techniques demonstrate that c-axis films grown at angles which deviate from the standard off-axis geometry produce nominally YBa2Cu3O7−x in the bulk with dramatic changes in the surface morphology and deposition rate. In addition to the common materials characterization techniques of scanning electron microscopy, x-ray diffraction, transport measurements, and conventional Rutherford backscattering spectrometry (RBS), angle-dependent RBS is employed to probe surface inhomogeneities of films grown at target–substrate angles away from the standard off-axis position.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.124763</identifier><language>eng</language><ispartof>Applied physics letters, 1999-09, Vol.75 (11), p.1589-1591</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c291t-b33689f49e759bdf7fd1f55643f1bcf9a33794ff1f9b34486c4f62e2a9763dc43</citedby><cites>FETCH-LOGICAL-c291t-b33689f49e759bdf7fd1f55643f1bcf9a33794ff1f9b34486c4f62e2a9763dc43</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,782,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Pugel, D. E.</creatorcontrib><creatorcontrib>Greene, L. H.</creatorcontrib><title>Influence of target–substrate angle on the elemental concentration of c -axis YBa2Cu3O7−x thin films</title><title>Applied physics letters</title><description>The thermalization processes in sputtering suggest a spatial dependence of elemental concentration in the sputter plume. A variety of analysis techniques demonstrate that c-axis films grown at angles which deviate from the standard off-axis geometry produce nominally YBa2Cu3O7−x in the bulk with dramatic changes in the surface morphology and deposition rate. In addition to the common materials characterization techniques of scanning electron microscopy, x-ray diffraction, transport measurements, and conventional Rutherford backscattering spectrometry (RBS), angle-dependent RBS is employed to probe surface inhomogeneities of films grown at target–substrate angles away from the standard off-axis position.</description><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1999</creationdate><recordtype>article</recordtype><recordid>eNotkM1KAzEUhYMoWKvgI2TpZmru3EzSLLX4Uyh0owtXQybNbUemqUxSqDuXrvUN-ySm1NXhcs534RzGrkGMQCi8hRGUUis8YQMQWhcIMD5lAyEEFspUcM4uYnzPZ1UiDthqGqjb-uA83xBPtl_6tP_6jdsmpt4mz21YdtkLPK08951f-5Bsx90mI-EQabOXUccLu2sjf7u35WSLc73__tllqA2c2m4dL9kZ2S76q38dstfHh5fJczGbP00nd7PClQZS0SCqsSFpvK5MsyBNC6CqUhIJGkfGImojiYBMg1KOlZOkSl9akzsvnMQhuzn-df0mxt5T_dG3a9t_1iDqw0I11MeF8A9zCVpw</recordid><startdate>19990913</startdate><enddate>19990913</enddate><creator>Pugel, D. E.</creator><creator>Greene, L. H.</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19990913</creationdate><title>Influence of target–substrate angle on the elemental concentration of c -axis YBa2Cu3O7−x thin films</title><author>Pugel, D. E. ; Greene, L. H.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c291t-b33689f49e759bdf7fd1f55643f1bcf9a33794ff1f9b34486c4f62e2a9763dc43</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1999</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Pugel, D. E.</creatorcontrib><creatorcontrib>Greene, L. H.</creatorcontrib><collection>CrossRef</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Pugel, D. E.</au><au>Greene, L. H.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Influence of target–substrate angle on the elemental concentration of c -axis YBa2Cu3O7−x thin films</atitle><jtitle>Applied physics letters</jtitle><date>1999-09-13</date><risdate>1999</risdate><volume>75</volume><issue>11</issue><spage>1589</spage><epage>1591</epage><pages>1589-1591</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><abstract>The thermalization processes in sputtering suggest a spatial dependence of elemental concentration in the sputter plume. A variety of analysis techniques demonstrate that c-axis films grown at angles which deviate from the standard off-axis geometry produce nominally YBa2Cu3O7−x in the bulk with dramatic changes in the surface morphology and deposition rate. In addition to the common materials characterization techniques of scanning electron microscopy, x-ray diffraction, transport measurements, and conventional Rutherford backscattering spectrometry (RBS), angle-dependent RBS is employed to probe surface inhomogeneities of films grown at target–substrate angles away from the standard off-axis position.</abstract><doi>10.1063/1.124763</doi><tpages>3</tpages></addata></record>
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1077-3118
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title Influence of target–substrate angle on the elemental concentration of c -axis YBa2Cu3O7−x thin films
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-29T11%3A33%3A16IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Influence%20of%20target%E2%80%93substrate%20angle%20on%20the%20elemental%20concentration%20of%20c%20-axis%20YBa2Cu3O7%E2%88%92x%20thin%20films&rft.jtitle=Applied%20physics%20letters&rft.au=Pugel,%20D.%20E.&rft.date=1999-09-13&rft.volume=75&rft.issue=11&rft.spage=1589&rft.epage=1591&rft.pages=1589-1591&rft.issn=0003-6951&rft.eissn=1077-3118&rft_id=info:doi/10.1063/1.124763&rft_dat=%3Ccrossref%3E10_1063_1_124763%3C/crossref%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c291t-b33689f49e759bdf7fd1f55643f1bcf9a33794ff1f9b34486c4f62e2a9763dc43%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true