Ortho-molecular hydrogen in hydrogenated amorphous silicon

Using a Jeener–Broekaert three-pulse sequence to measure directly the concentration of o-H2 by H1 nuclear magnetic resonance (NMR), we find that this concentration is one order of magnitude larger than that previously inferred from spin-lattice relaxation time (T1) measurements. At 300 K, this conce...

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Bibliographic Details
Published in:Applied physics letters 2000-01, Vol.76 (5), p.565-567
Main Authors: Su, Tining, Taylor, P. C., Chen, Shenlin, Crandall, R. S., Mahan, A. H.
Format: Article
Language:English
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Summary:Using a Jeener–Broekaert three-pulse sequence to measure directly the concentration of o-H2 by H1 nuclear magnetic resonance (NMR), we find that this concentration is one order of magnitude larger than that previously inferred from spin-lattice relaxation time (T1) measurements. At 300 K, this concentration of o-H2 contributes at most 30% to the narrow H1 NMR line attributed to hydrogen bonded to silicon. For a plasma-enhanced-chemical-vapor-deposition (PECVD) sample, two distinct values of T1 for o-H2 are found, only one of which contributes to the T1 for bonded hydrogen. In hot-wire-chemical-vapor-deposition samples, the line shape of o-H2 exhibits motional narrowing at lower temperatures, suggesting a more ordered structure than in a typical PECVD sample.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.125818