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Capacitance–voltage and admittance spectroscopy of self-assembled Ge islands in Si
We investigate the electrical properties of self-assembled Ge islands embedded in Si Schottky diode structures by means of capacitance–voltage measurements and admittance spectroscopy. The Ge islands form at T=550 °C by self-assembly in the Stranski–Krastanow growth mode with an area density of 4.5×...
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Published in: | Applied physics letters 2000-10, Vol.77 (17), p.2704-2706 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | We investigate the electrical properties of self-assembled Ge islands embedded in Si Schottky diode structures by means of capacitance–voltage measurements and admittance spectroscopy. The Ge islands form at T=550 °C by self-assembly in the Stranski–Krastanow growth mode with an area density of 4.5×109 cm−2. Their diameter and height are 70 and 6.5 nm, respectively. A linear increase of the thermal activation energy observed in voltage-dependent admittance spectroscopy shows that the ensemble of Ge islands has a low, continuous, averaged density of states. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.1320036 |