Near-infrared Yablonovite-like photonic crystals by focused-ion-beam etching of macroporous silicon

We report on the fabrication of three-dimensional (3D) Yablonovite-like photonic crystals by focused-ion-beam (FIB) etching of macroporous silicon. Crystals containing up to 25×25×5 lattice cells are fabricated with a submicronic period of ∼0.75 μm. Photonic band gaps at wavelengths close to 3 μm ar...

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Bibliographic Details
Published in:Applied physics letters 2000-11, Vol.77 (19), p.2943-2945
Main Authors: Chelnokov, A., Wang, K., Rowson, S., Garoche, P., Lourtioz, J.-M.
Format: Article
Language:English
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Summary:We report on the fabrication of three-dimensional (3D) Yablonovite-like photonic crystals by focused-ion-beam (FIB) etching of macroporous silicon. Crystals containing up to 25×25×5 lattice cells are fabricated with a submicronic period of ∼0.75 μm. Photonic band gaps at wavelengths close to 3 μm are demonstrated from reflection measurements and confirmed by numerical calculations. The combination of plasma or chemical etching with FIB micromachining appears to be promising for the fabrication of a large variety of multiple-period 3D photonic crystals at optical wavelengths.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1322630