Roughness evolution in polyimide films during plasma etching

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Bibliographic Details
Published in:Applied physics letters 2001-04, Vol.78 (16), p.2294-2296
Main Authors: Agarwal, Navnit, Ponoth, Shom, Plawsky, Joel, Persans, P. D.
Format: Article
Language:English
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ISSN:0003-6951
1077-3118
DOI:10.1063/1.1364507