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Concurrent x-ray diffractometer for high throughput structural diagnosis of epitaxial thin films

We have developed a concurrent x-ray diffractometer that concurrently measures spatially resolved x-ray diffraction (XRD) spectra of epitaxial thin films integrated on a substrate. A convergent x-ray is focused into stripe on a substrate and the diffracted beam is detected with a two-dimensional x-r...

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Published in:Applied physics letters 2001-11, Vol.79 (22), p.3594-3596
Main Authors: Ohtani, M., Fukumura, T., Kawasaki, M., Omote, K., Kikuchi, T., Harada, J., Ohtomo, A., Lippmaa, M., Ohnishi, T., Komiyama, D., Takahashi, R., Matsumoto, Y., Koinuma, H.
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cited_by cdi_FETCH-LOGICAL-c401t-f5e6ef47b778b3e1151961d03dbe131b500745925fe6be571c4b8343f71930613
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container_end_page 3596
container_issue 22
container_start_page 3594
container_title Applied physics letters
container_volume 79
creator Ohtani, M.
Fukumura, T.
Kawasaki, M.
Omote, K.
Kikuchi, T.
Harada, J.
Ohtomo, A.
Lippmaa, M.
Ohnishi, T.
Komiyama, D.
Takahashi, R.
Matsumoto, Y.
Koinuma, H.
description We have developed a concurrent x-ray diffractometer that concurrently measures spatially resolved x-ray diffraction (XRD) spectra of epitaxial thin films integrated on a substrate. A convergent x-ray is focused into stripe on a substrate and the diffracted beam is detected with a two-dimensional x-ray detector. The obtained snapshot image represents a mapping of XRD intensity with the axes of the diffraction angle and the position in the sample. In addition to the parallel XRD measurements of thin films with various compositions and structures, two-dimensional spatial mapping of XRD peak with a resolution of ∼100 μm is demonstrated. This technique will provide us a high throughput characterization method of various devices composed of epitaxial films.
doi_str_mv 10.1063/1.1415402
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title Concurrent x-ray diffractometer for high throughput structural diagnosis of epitaxial thin films
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