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Spatially-resolved valence-electron energy-loss spectroscopy of Zr-oxide and Zr-silicate films
We examined electronic structures in Zr-oxide (ZrO2) and Zr-silicate (ZrxSi1−xO2) films deposited on Si substrates by using valence-electron energy-loss spectroscopy combined with scanning transmission electron microscopy (the electron probe diameter was about 0.3 nm). Our analysis indicated that bo...
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Published in: | Applied physics letters 2002-06, Vol.80 (22), p.4127-4129 |
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container_end_page | 4129 |
container_issue | 22 |
container_start_page | 4127 |
container_title | Applied physics letters |
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creator | Ikarashi, Nobuyuki Manabe, Kenzo |
description | We examined electronic structures in Zr-oxide (ZrO2) and Zr-silicate (ZrxSi1−xO2) films deposited on Si substrates by using valence-electron energy-loss spectroscopy combined with scanning transmission electron microscopy (the electron probe diameter was about 0.3 nm). Our analysis indicated that both valence-electron excitations in ZrO2 and in SiO2 occurred in the ZrxSi1−xO2 films. Therefore, the band gaps in the ZrxSi1−xO2 films should be dominated by an energy gap between O 2p and Zr 4d states. |
doi_str_mv | 10.1063/1.1483130 |
format | article |
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Our analysis indicated that both valence-electron excitations in ZrO2 and in SiO2 occurred in the ZrxSi1−xO2 films. 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Our analysis indicated that both valence-electron excitations in ZrO2 and in SiO2 occurred in the ZrxSi1−xO2 films. 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Our analysis indicated that both valence-electron excitations in ZrO2 and in SiO2 occurred in the ZrxSi1−xO2 films. Therefore, the band gaps in the ZrxSi1−xO2 films should be dominated by an energy gap between O 2p and Zr 4d states.</abstract><doi>10.1063/1.1483130</doi><tpages>3</tpages></addata></record> |
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title | Spatially-resolved valence-electron energy-loss spectroscopy of Zr-oxide and Zr-silicate films |
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