Solid-state halogen atom source for chemical dynamics and etching

We describe a solid-state Br atom source for surface etching, kinetics, and reaction dynamics studies. Pulsed laser irradiation of crystalline KBr, near the bulk absorption threshold at 6 eV, produces hyperthermal Br atoms in dense plumes. The Br atom density and velocities may be controlled by choi...

Full description

Saved in:
Bibliographic Details
Published in:Applied physics letters 2002-08, Vol.81 (6), p.1140-1142
Main Authors: Hess, Wayne P., Joly, Alan G., Beck, Kenneth M., Gerrity, Daniel P., Sushko, Peter V., Shluger, Alexander L.
Format: Article
Language:English
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:We describe a solid-state Br atom source for surface etching, kinetics, and reaction dynamics studies. Pulsed laser irradiation of crystalline KBr, near the bulk absorption threshold at 6 eV, produces hyperthermal Br atoms in dense plumes. The Br atom density and velocities may be controlled by choice of laser pulse power and photon energy. Single and multiple pulse excitation of KBr produces Br and Br* in controllable quantities and velocities, thus providing an attractive ultrahigh vacuum compatible solid-state radical atom source. The solid-state atom source is in principle extendable to other halogens using other alkali halides and perhaps other materials.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1488700