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Hydrogen-induced degradation in ferroelectric Bi3.25La0.75Ti3O12
Effects of forming gas annealing (FGA) were investigated on ferroelectric Bi3.25La0.75Ti3O12 (BLT) thin films fabricated by a chemical solution deposition. With the FGA up to 350 °C, the Pt/BLT/Pt capacitors showed good ferroelectric characteristics without significant degradation. As the FGA temper...
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Published in: | Applied physics letters 2002-09, Vol.81 (10), p.1857-1859 |
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Main Authors: | , , , , , , , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Effects of forming gas annealing (FGA) were investigated on ferroelectric Bi3.25La0.75Ti3O12 (BLT) thin films fabricated by a chemical solution deposition. With the FGA up to 350 °C, the Pt/BLT/Pt capacitors showed good ferroelectric characteristics without significant degradation. As the FGA temperature was increased, a decomposition of the BLT powder sample was observed by using thermogravimetric analysis. By comparing the time-dependent weight loss of BLT with that of Bi4Ti3O12 during FGA, La doping was found to significantly impede the decomposition rate. The decomposition, especially in the (Bi2O2)2+ layers, was discussed as a hydrogen-induced degradation mechanism in the Bi-layered perovskite ferroelectrics. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.1505110 |