Nanoring formation by direct-write inorganic electron-beam lithography

A direct-write inorganic lithography technique is described which is capable of forming nanoscale rings of amorphous metals and semiconductors in glasses. Near-edge electron energy loss spectroscopy and electron diffraction using a subnanometer probe are used to analyze the composition and formation...

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Bibliographic Details
Published in:Applied physics letters 2003-07, Vol.83 (3), p.551-553
Main Authors: Jiang, N., Hembree, G. G., Spence, J. C. H., Qiu, J., Garcia de Abajo, F. J., Silcox, J.
Format: Article
Language:English
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Summary:A direct-write inorganic lithography technique is described which is capable of forming nanoscale rings of amorphous metals and semiconductors in glasses. Near-edge electron energy loss spectroscopy and electron diffraction using a subnanometer probe are used to analyze the composition and formation mechanism of these nanorings. The optical absorption cross section of one ring is calculated by multiple scattering methods. Applications in quantum electronics and the design of media with dielectric properties are suggested.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1592895