Electron Attachment in Ionized Flows at Elevated Gas Temperatures

An ionized argon flow (electron concentration of the order of 1012 per cm3), at elevated gas temperatures, is obtained by arc heating. The flow is admitted in a mixing chamber where small additive fractions (order of 10-4) of an electrophilic compound, (SF6), are injected into and mixed with the flo...

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Bibliographic Details
Published in:Journal of applied physics 1968-01, Vol.39 (8), p.3675-3682
Main Author: Malliaris, A. C.
Format: Article
Language:English
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Summary:An ionized argon flow (electron concentration of the order of 1012 per cm3), at elevated gas temperatures, is obtained by arc heating. The flow is admitted in a mixing chamber where small additive fractions (order of 10-4) of an electrophilic compound, (SF6), are injected into and mixed with the flow. The mixtures are incubated under specified incubation conditions (3000° to 5000°K, 0.1 to 1 atm, 10-3 to 10-4 sec). Electron and ion concentrations are determined at the end of the incubation and for this, both single and double Langmuir probes are used. Auxiliary probing is also carried out by an x-band microwave beam. Suppression of the electron concentration by factors ranging from 2 to over 1000 are determined, depending on experimental conditions. By experimental evidence it is demonstrated that the suppression of the electron concentration is the result of negative ion formation and survival. Charge neutralization processes are relatively negligible.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.1656839