A photoresist film applicator for long and fragile crystal substrates

Long and fragile crystal substrates can be processed in a drawing device that produces uniform photoresist coatings on them. The film thickness can be varied with the pulling speed, from 2500 to 4300 Å in a single pull. Thickness uniformities of ± 80 Å over the entire surface have been obtained.

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Bibliographic Details
Published in:Review of scientific instruments 1973-11, Vol.44 (11), p.1671-1672
Main Authors: Stiglitz, Martin R., Kearns, William J.
Format: Article
Language:English
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Description
Summary:Long and fragile crystal substrates can be processed in a drawing device that produces uniform photoresist coatings on them. The film thickness can be varied with the pulling speed, from 2500 to 4300 Å in a single pull. Thickness uniformities of ± 80 Å over the entire surface have been obtained.
ISSN:0034-6748
1089-7623
DOI:10.1063/1.1686028