Response to “Comment on ‘Low level plasma formation in a carbon velvet cesium iodide coated cathode’ ” [Phys. Plasmas 11, 5730 (2004)]

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Bibliographic Details
Published in:Physics of plasmas 2004-12, Vol.11 (12), p.5732-5733
Main Authors: Shiffler, D., Heggemeier, J., LaCour, M., Golby, K., Ruebush, M.
Format: Article
Language:English
Subjects:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
CARBON
CATHODES
CESIUM IODIDES
PLASMA
PLASMA PRODUCTION
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ISSN:1070-664X
1089-7674
DOI:10.1063/1.1811618