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Nanoscale chemical etching of near-stoichiometric lithium tantalate
The chemical etching properties of ferroelectric Li Ta O 3 crystal in near-stoichiometric compositions were quantitatively investigated with various ratios of HF and H N O 3 acid mixtures by scanning force microscopy in the nanoscale range. Along with congruent Li Ta O 3 crystal, the − Z surfaces of...
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| Published in: | Journal of applied physics 2005-03, Vol.97 (6), p.064308-064308-4 |
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| Main Authors: | , , , , |
| Format: | Article |
| Language: | English |
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| cited_by | cdi_FETCH-LOGICAL-c350t-d2a86b4b3dd56965cfeb70dbf5cca638638a480aa585d74a8abe09990315fd9a3 |
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| cites | cdi_FETCH-LOGICAL-c350t-d2a86b4b3dd56965cfeb70dbf5cca638638a480aa585d74a8abe09990315fd9a3 |
| container_end_page | 064308-4 |
| container_issue | 6 |
| container_start_page | 064308 |
| container_title | Journal of applied physics |
| container_volume | 97 |
| creator | Liu, Xiaoyan Terabe, Kazuya Nakamura, Masaru Takekawa, Shunji Kitamura, Kenji |
| description | The chemical etching properties of ferroelectric
Li
Ta
O
3
crystal in near-stoichiometric compositions were quantitatively investigated with various ratios of HF and
H
N
O
3
acid mixtures by scanning force microscopy in the nanoscale range. Along with congruent
Li
Ta
O
3
crystal, the
−
Z
surfaces of near-stoichiometric
Li
Ta
O
3
crystal were etched preferentially with pure HF acid and mixtures of HF and
H
N
O
3
acids. The etching rates on the
−
Z
surface of near-stoichiometric
Li
Ta
O
3
crystal were slower than that of congruent
Li
Ta
O
3
crystal. The roughness (peak to peak) of etched surfaces were about
2
nm
after being etched in all ratios of HF and
H
N
O
3
acids to a
70
-
nm
etch depth. The temperature dependence of the etch rate followed the Arrhenius law. By taking advantage of the chemical preferential etching properties, precision surface structures could be fabricated on near-stoichiometric
Li
Ta
O
3
crystal. |
| doi_str_mv | 10.1063/1.1870115 |
| format | article |
| fullrecord | <record><control><sourceid>scitation_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1063_1_1870115</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>jap</sourcerecordid><originalsourceid>FETCH-LOGICAL-c350t-d2a86b4b3dd56965cfeb70dbf5cca638638a480aa585d74a8abe09990315fd9a3</originalsourceid><addsrcrecordid>eNp1kE9LxDAUxIMoWFcPfoNePWR92TRtchGk6CosetFzeM0fG2kbaeLBb29lV2_CwBuGHw9mCLlksGZQ82u2ZrIBxsQRKRhIRRsh4JgUABtGpWrUKTlL6R0WRHJVkPYJp5gMDq40vRvD4kqXTR-mtzL6cnI405RjWJI4ujwHUw4h9-FzLDNOGQfM7pyceBySuzjcFXm9v3tpH-juefvY3u6o4QIytRuUdVd13FpRq1oY77oGbOeFMVhzuQgrCYhCCttUKLFzoJQCzoS3CvmKXO3_mjmmNDuvP-Yw4vylGeif9prpQ_uFvdmzyYSMOcTpf_hvAv07gXb8G-z3YqA</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Nanoscale chemical etching of near-stoichiometric lithium tantalate</title><source>American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list)</source><creator>Liu, Xiaoyan ; Terabe, Kazuya ; Nakamura, Masaru ; Takekawa, Shunji ; Kitamura, Kenji</creator><creatorcontrib>Liu, Xiaoyan ; Terabe, Kazuya ; Nakamura, Masaru ; Takekawa, Shunji ; Kitamura, Kenji</creatorcontrib><description>The chemical etching properties of ferroelectric
Li
Ta
O
3
crystal in near-stoichiometric compositions were quantitatively investigated with various ratios of HF and
H
N
O
3
acid mixtures by scanning force microscopy in the nanoscale range. Along with congruent
Li
Ta
O
3
crystal, the
−
Z
surfaces of near-stoichiometric
Li
Ta
O
3
crystal were etched preferentially with pure HF acid and mixtures of HF and
H
N
O
3
acids. The etching rates on the
−
Z
surface of near-stoichiometric
Li
Ta
O
3
crystal were slower than that of congruent
Li
Ta
O
3
crystal. The roughness (peak to peak) of etched surfaces were about
2
nm
after being etched in all ratios of HF and
H
N
O
3
acids to a
70
-
nm
etch depth. The temperature dependence of the etch rate followed the Arrhenius law. By taking advantage of the chemical preferential etching properties, precision surface structures could be fabricated on near-stoichiometric
Li
Ta
O
3
crystal.</description><identifier>ISSN: 0021-8979</identifier><identifier>EISSN: 1089-7550</identifier><identifier>DOI: 10.1063/1.1870115</identifier><identifier>CODEN: JAPIAU</identifier><language>eng</language><publisher>American Institute of Physics</publisher><ispartof>Journal of applied physics, 2005-03, Vol.97 (6), p.064308-064308-4</ispartof><rights>2005 American Institute of Physics</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c350t-d2a86b4b3dd56965cfeb70dbf5cca638638a480aa585d74a8abe09990315fd9a3</citedby><cites>FETCH-LOGICAL-c350t-d2a86b4b3dd56965cfeb70dbf5cca638638a480aa585d74a8abe09990315fd9a3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Liu, Xiaoyan</creatorcontrib><creatorcontrib>Terabe, Kazuya</creatorcontrib><creatorcontrib>Nakamura, Masaru</creatorcontrib><creatorcontrib>Takekawa, Shunji</creatorcontrib><creatorcontrib>Kitamura, Kenji</creatorcontrib><title>Nanoscale chemical etching of near-stoichiometric lithium tantalate</title><title>Journal of applied physics</title><description>The chemical etching properties of ferroelectric
Li
Ta
O
3
crystal in near-stoichiometric compositions were quantitatively investigated with various ratios of HF and
H
N
O
3
acid mixtures by scanning force microscopy in the nanoscale range. Along with congruent
Li
Ta
O
3
crystal, the
−
Z
surfaces of near-stoichiometric
Li
Ta
O
3
crystal were etched preferentially with pure HF acid and mixtures of HF and
H
N
O
3
acids. The etching rates on the
−
Z
surface of near-stoichiometric
Li
Ta
O
3
crystal were slower than that of congruent
Li
Ta
O
3
crystal. The roughness (peak to peak) of etched surfaces were about
2
nm
after being etched in all ratios of HF and
H
N
O
3
acids to a
70
-
nm
etch depth. The temperature dependence of the etch rate followed the Arrhenius law. By taking advantage of the chemical preferential etching properties, precision surface structures could be fabricated on near-stoichiometric
Li
Ta
O
3
crystal.</description><issn>0021-8979</issn><issn>1089-7550</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2005</creationdate><recordtype>article</recordtype><recordid>eNp1kE9LxDAUxIMoWFcPfoNePWR92TRtchGk6CosetFzeM0fG2kbaeLBb29lV2_CwBuGHw9mCLlksGZQ82u2ZrIBxsQRKRhIRRsh4JgUABtGpWrUKTlL6R0WRHJVkPYJp5gMDq40vRvD4kqXTR-mtzL6cnI405RjWJI4ujwHUw4h9-FzLDNOGQfM7pyceBySuzjcFXm9v3tpH-juefvY3u6o4QIytRuUdVd13FpRq1oY77oGbOeFMVhzuQgrCYhCCttUKLFzoJQCzoS3CvmKXO3_mjmmNDuvP-Yw4vylGeif9prpQ_uFvdmzyYSMOcTpf_hvAv07gXb8G-z3YqA</recordid><startdate>20050315</startdate><enddate>20050315</enddate><creator>Liu, Xiaoyan</creator><creator>Terabe, Kazuya</creator><creator>Nakamura, Masaru</creator><creator>Takekawa, Shunji</creator><creator>Kitamura, Kenji</creator><general>American Institute of Physics</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20050315</creationdate><title>Nanoscale chemical etching of near-stoichiometric lithium tantalate</title><author>Liu, Xiaoyan ; Terabe, Kazuya ; Nakamura, Masaru ; Takekawa, Shunji ; Kitamura, Kenji</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c350t-d2a86b4b3dd56965cfeb70dbf5cca638638a480aa585d74a8abe09990315fd9a3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2005</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Liu, Xiaoyan</creatorcontrib><creatorcontrib>Terabe, Kazuya</creatorcontrib><creatorcontrib>Nakamura, Masaru</creatorcontrib><creatorcontrib>Takekawa, Shunji</creatorcontrib><creatorcontrib>Kitamura, Kenji</creatorcontrib><collection>CrossRef</collection><jtitle>Journal of applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Liu, Xiaoyan</au><au>Terabe, Kazuya</au><au>Nakamura, Masaru</au><au>Takekawa, Shunji</au><au>Kitamura, Kenji</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Nanoscale chemical etching of near-stoichiometric lithium tantalate</atitle><jtitle>Journal of applied physics</jtitle><date>2005-03-15</date><risdate>2005</risdate><volume>97</volume><issue>6</issue><spage>064308</spage><epage>064308-4</epage><pages>064308-064308-4</pages><issn>0021-8979</issn><eissn>1089-7550</eissn><coden>JAPIAU</coden><abstract>The chemical etching properties of ferroelectric
Li
Ta
O
3
crystal in near-stoichiometric compositions were quantitatively investigated with various ratios of HF and
H
N
O
3
acid mixtures by scanning force microscopy in the nanoscale range. Along with congruent
Li
Ta
O
3
crystal, the
−
Z
surfaces of near-stoichiometric
Li
Ta
O
3
crystal were etched preferentially with pure HF acid and mixtures of HF and
H
N
O
3
acids. The etching rates on the
−
Z
surface of near-stoichiometric
Li
Ta
O
3
crystal were slower than that of congruent
Li
Ta
O
3
crystal. The roughness (peak to peak) of etched surfaces were about
2
nm
after being etched in all ratios of HF and
H
N
O
3
acids to a
70
-
nm
etch depth. The temperature dependence of the etch rate followed the Arrhenius law. By taking advantage of the chemical preferential etching properties, precision surface structures could be fabricated on near-stoichiometric
Li
Ta
O
3
crystal.</abstract><pub>American Institute of Physics</pub><doi>10.1063/1.1870115</doi></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0021-8979 |
| ispartof | Journal of applied physics, 2005-03, Vol.97 (6), p.064308-064308-4 |
| issn | 0021-8979 1089-7550 |
| language | eng |
| recordid | cdi_crossref_primary_10_1063_1_1870115 |
| source | American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list) |
| title | Nanoscale chemical etching of near-stoichiometric lithium tantalate |
| url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-06T23%3A25%3A54IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-scitation_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Nanoscale%20chemical%20etching%20of%20near-stoichiometric%20lithium%20tantalate&rft.jtitle=Journal%20of%20applied%20physics&rft.au=Liu,%20Xiaoyan&rft.date=2005-03-15&rft.volume=97&rft.issue=6&rft.spage=064308&rft.epage=064308-4&rft.pages=064308-064308-4&rft.issn=0021-8979&rft.eissn=1089-7550&rft.coden=JAPIAU&rft_id=info:doi/10.1063/1.1870115&rft_dat=%3Cscitation_cross%3Ejap%3C/scitation_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c350t-d2a86b4b3dd56965cfeb70dbf5cca638638a480aa585d74a8abe09990315fd9a3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |