Mask-free photolithographic exposure using a matrix-addressable micropixellated AlInGaN ultraviolet light-emitting diode

We report the integration of a UV-curable polymer microlens array onto a matrix-addressable, 368 - nm -wavelength, light-emitting diode device containing 64 × 64 micropixel elements. The geometrical and optical parameters of the microlenses were carefully chosen to allow the highly divergent emissio...

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Bibliographic Details
Published in:Applied physics letters 2005-05, Vol.86 (22), p.221105-221105-3
Main Authors: Jeon, C. W., Gu, E., Dawson, M. D.
Format: Article
Language:English
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Summary:We report the integration of a UV-curable polymer microlens array onto a matrix-addressable, 368 - nm -wavelength, light-emitting diode device containing 64 × 64 micropixel elements. The geometrical and optical parameters of the microlenses were carefully chosen to allow the highly divergent emission from each micropixel to be collimated into a narrow beam of about 8 - μ m diam, over a distance of more than 500 μ m . This device is demonstrated as a photolithographic exposure tool, where the pattern-programmable array plays the role both of light source and photomask. A simple pattern comprised of two disks having 16 - μ m diam and 30 - μ m spacing was transferred into an i -line photoresist.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1942636