Fabrication of efficient microaxicon by direct electron-beam lithography for long nondiffracting distance of Bessel beams for optical manipulation

We demonstrate a fabrication technique in the realization of microaxicon by single-step processing via electron-beam lithography. Microaxicon is used for the generation of propagation-invariant Bessel beams which find tremendous applications in optical trapping. The proposed technique is a simple, r...

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Bibliographic Details
Published in:Applied physics letters 2005-07, Vol.87 (2)
Main Authors: Cheong, W. C., Ahluwalia, B. P. S., Yuan, X.-C., Zhang, L.-S., Wang, H., Niu, H. B., Peng, X.
Format: Article
Language:English
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Summary:We demonstrate a fabrication technique in the realization of microaxicon by single-step processing via electron-beam lithography. Microaxicon is used for the generation of propagation-invariant Bessel beams which find tremendous applications in optical trapping. The proposed technique is a simple, reliable, and reproducible method for the production of high-quality Bessel beams with long propagation-invariant distances, in our configuration, in excess of 20cm. Such Bessel beams with long nondiffracting distances are essential for optical tweezers systems in many cases.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1953876