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Hydrogen passivation of germanium (100) surface using wet chemical preparation

A wet chemical preparation involving de-ionized water, hydrogen peroxide, and hydrofluoric acid is used to passivate germanium (Ge) (100) surfaces. Infrared absorption spectroscopy and x-ray photoemission spectroscopy studies show that oxide free and hydrogen-terminated Ge (100) surfaces can be obta...

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Bibliographic Details
Published in:Applied physics letters 2005-12, Vol.87 (25)
Main Authors: Rivillon, Sandrine, Chabal, Yves J., Amy, Fabrice, Kahn, Antoine
Format: Article
Language:English
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Summary:A wet chemical preparation involving de-ionized water, hydrogen peroxide, and hydrofluoric acid is used to passivate germanium (Ge) (100) surfaces. Infrared absorption spectroscopy and x-ray photoemission spectroscopy studies show that oxide free and hydrogen-terminated Ge (100) surfaces can be obtained. As in the case for silicon (100) surfaces etched in hydrofluoric acid, hydrogen-terminated Ge (100) surfaces are atomically rough, with primarily mono- and dihydride terminations.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2142084