Nanoimprint pattern transfer quality from specular x-ray reflectivity

Specular x-ray reflectivity is used for high precision measurements of the pattern height, residual layer thickness, and the line-to-space ratio for parallel line and space patterns fabricated with nanoimprint lithography. The line-to-space ratio is profiled vertically to reveal relative linewidth v...

Full description

Saved in:
Bibliographic Details
Published in:Applied physics letters 2005-12, Vol.87 (26), p.263111-263111-3
Main Authors: Lee, Hae-Jeong, Soles, Christopher L., Ro, Hyun Wook, Jones, Ronald L., Lin, Eric K., Wu, Wen-li, Hines, Daniel R.
Format: Article
Language:English
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Specular x-ray reflectivity is used for high precision measurements of the pattern height, residual layer thickness, and the line-to-space ratio for parallel line and space patterns fabricated with nanoimprint lithography. The line-to-space ratio is profiled vertically to reveal relative linewidth variations as a function of the feature height. These relative linewidth variations are quantified through an external measure of the average pitch to fully define the line shape profile or cross section. An excellent fidelity of the nanoimprint pattern transfer process is quantified by comparing the line shape profiles of the mold to the imprinted pattern.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2158512