Fabricating subwavelength array structures using a near-field photolithographic method

This work presents a photolithographic approach for producing high aspect ratio arrays in photoresist. The photomask is composed of hexagonal/square rod arrays with a thickness of 0.2 μ m and a period of 600 nm . Illuminating the photomask with a blue laser generates periodically focused beams up to...

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Bibliographic Details
Published in:Applied physics letters 2006-03, Vol.88 (10), p.101109-101109-3
Main Authors: Chang, Wei-Lun, Chang, Yu-Jen, Wei, Pei-Kuen, Tsao, Pei Hsi
Format: Article
Language:English
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Summary:This work presents a photolithographic approach for producing high aspect ratio arrays in photoresist. The photomask is composed of hexagonal/square rod arrays with a thickness of 0.2 μ m and a period of 600 nm . Illuminating the photomask with a blue laser generates periodically focused beams up to 1 μ m long and less than 300 nm wide. A hexagonal rod array provides a better focused beam than a square array due to its higher symmetry. Finite-difference time-domain calculations elucidate the existence of long focused beams above the photomask. Optical near-field measurements verified those subwavelength beams originating from the rod regions.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2185249