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Fabricating subwavelength array structures using a near-field photolithographic method
This work presents a photolithographic approach for producing high aspect ratio arrays in photoresist. The photomask is composed of hexagonal/square rod arrays with a thickness of 0.2 μ m and a period of 600 nm . Illuminating the photomask with a blue laser generates periodically focused beams up to...
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| Published in: | Applied physics letters 2006-03, Vol.88 (10), p.101109-101109-3 |
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| Main Authors: | , , , |
| Format: | Article |
| Language: | English |
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| cited_by | cdi_FETCH-LOGICAL-c284t-bca1058b8938b6c05fba0b78fb902feb424fca13e28e610788dd53451b446d9e3 |
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| cites | cdi_FETCH-LOGICAL-c284t-bca1058b8938b6c05fba0b78fb902feb424fca13e28e610788dd53451b446d9e3 |
| container_end_page | 101109-3 |
| container_issue | 10 |
| container_start_page | 101109 |
| container_title | Applied physics letters |
| container_volume | 88 |
| creator | Chang, Wei-Lun Chang, Yu-Jen Wei, Pei-Kuen Tsao, Pei Hsi |
| description | This work presents a photolithographic approach for producing high aspect ratio arrays in photoresist. The photomask is composed of hexagonal/square rod arrays with a thickness of
0.2
μ
m
and a period of
600
nm
. Illuminating the photomask with a blue laser generates periodically focused beams up to
1
μ
m
long and less than
300
nm
wide. A hexagonal rod array provides a better focused beam than a square array due to its higher symmetry. Finite-difference time-domain calculations elucidate the existence of long focused beams above the photomask. Optical near-field measurements verified those subwavelength beams originating from the rod regions. |
| doi_str_mv | 10.1063/1.2185249 |
| format | article |
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0.2
μ
m
and a period of
600
nm
. Illuminating the photomask with a blue laser generates periodically focused beams up to
1
μ
m
long and less than
300
nm
wide. A hexagonal rod array provides a better focused beam than a square array due to its higher symmetry. Finite-difference time-domain calculations elucidate the existence of long focused beams above the photomask. Optical near-field measurements verified those subwavelength beams originating from the rod regions.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.2185249</identifier><identifier>CODEN: APPLAB</identifier><language>eng</language><publisher>American Institute of Physics</publisher><ispartof>Applied physics letters, 2006-03, Vol.88 (10), p.101109-101109-3</ispartof><rights>2006 American Institute of Physics</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c284t-bca1058b8938b6c05fba0b78fb902feb424fca13e28e610788dd53451b446d9e3</citedby><cites>FETCH-LOGICAL-c284t-bca1058b8938b6c05fba0b78fb902feb424fca13e28e610788dd53451b446d9e3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://pubs.aip.org/apl/article-lookup/doi/10.1063/1.2185249$$EHTML$$P50$$Gscitation$$H</linktohtml><link.rule.ids>314,780,782,784,795,27924,27925,76383</link.rule.ids></links><search><creatorcontrib>Chang, Wei-Lun</creatorcontrib><creatorcontrib>Chang, Yu-Jen</creatorcontrib><creatorcontrib>Wei, Pei-Kuen</creatorcontrib><creatorcontrib>Tsao, Pei Hsi</creatorcontrib><title>Fabricating subwavelength array structures using a near-field photolithographic method</title><title>Applied physics letters</title><description>This work presents a photolithographic approach for producing high aspect ratio arrays in photoresist. The photomask is composed of hexagonal/square rod arrays with a thickness of
0.2
μ
m
and a period of
600
nm
. Illuminating the photomask with a blue laser generates periodically focused beams up to
1
μ
m
long and less than
300
nm
wide. A hexagonal rod array provides a better focused beam than a square array due to its higher symmetry. Finite-difference time-domain calculations elucidate the existence of long focused beams above the photomask. Optical near-field measurements verified those subwavelength beams originating from the rod regions.</description><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2006</creationdate><recordtype>article</recordtype><recordid>eNp1kM9LwzAAhYMoWKcH_4NcPXTmZ5teBBluCgMv6rUkadJGurYkqbL_3oxN8OLp8eDjwfsAuMVoiVFB7_GSYMEJq85AhlFZ5hRjcQ4yhBDNi4rjS3AVwmeqnFCagY-1VN5pGd3QwjCrb_llejO0sYPSe7mHIfpZx9mbAOdwgCQcjPS5daZv4NSNcexd7MbWy6lzGu5MKs01uLCyD-bmlAvwvn56Wz3n29fNy-pxm2siWMyVlhhxoURFhSo04lZJpEphVYWINYoRZhNCDRGmSHeEaBpOGceKsaKpDF2Au-Ou9mMI3th68m4n_b7GqD4IqXF9EpLYhyMbtIvp8Dj8D_-xUv9aoT8poGoq</recordid><startdate>20060306</startdate><enddate>20060306</enddate><creator>Chang, Wei-Lun</creator><creator>Chang, Yu-Jen</creator><creator>Wei, Pei-Kuen</creator><creator>Tsao, Pei Hsi</creator><general>American Institute of Physics</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20060306</creationdate><title>Fabricating subwavelength array structures using a near-field photolithographic method</title><author>Chang, Wei-Lun ; Chang, Yu-Jen ; Wei, Pei-Kuen ; Tsao, Pei Hsi</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c284t-bca1058b8938b6c05fba0b78fb902feb424fca13e28e610788dd53451b446d9e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2006</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Chang, Wei-Lun</creatorcontrib><creatorcontrib>Chang, Yu-Jen</creatorcontrib><creatorcontrib>Wei, Pei-Kuen</creatorcontrib><creatorcontrib>Tsao, Pei Hsi</creatorcontrib><collection>CrossRef</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Chang, Wei-Lun</au><au>Chang, Yu-Jen</au><au>Wei, Pei-Kuen</au><au>Tsao, Pei Hsi</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Fabricating subwavelength array structures using a near-field photolithographic method</atitle><jtitle>Applied physics letters</jtitle><date>2006-03-06</date><risdate>2006</risdate><volume>88</volume><issue>10</issue><spage>101109</spage><epage>101109-3</epage><pages>101109-101109-3</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><coden>APPLAB</coden><abstract>This work presents a photolithographic approach for producing high aspect ratio arrays in photoresist. The photomask is composed of hexagonal/square rod arrays with a thickness of
0.2
μ
m
and a period of
600
nm
. Illuminating the photomask with a blue laser generates periodically focused beams up to
1
μ
m
long and less than
300
nm
wide. A hexagonal rod array provides a better focused beam than a square array due to its higher symmetry. Finite-difference time-domain calculations elucidate the existence of long focused beams above the photomask. Optical near-field measurements verified those subwavelength beams originating from the rod regions.</abstract><pub>American Institute of Physics</pub><doi>10.1063/1.2185249</doi></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0003-6951 |
| ispartof | Applied physics letters, 2006-03, Vol.88 (10), p.101109-101109-3 |
| issn | 0003-6951 1077-3118 |
| language | eng |
| recordid | cdi_crossref_primary_10_1063_1_2185249 |
| source | American Institute of Physics (AIP) Publications; American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list) |
| title | Fabricating subwavelength array structures using a near-field photolithographic method |
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