Cryogenic two-photon laser photolithography with SU-8

We have shown that photolithography can be used to create alignment markers on a semiconductor substrate at cryogenic temperatures. The epoxy resist SU-8 can be exposed effectively by two-photon absorption at a temperature of 4 K . By this means a spectroscopy apparatus can be used to find the posit...

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Bibliographic Details
Published in:Applied physics letters 2006-04, Vol.88 (14), p.143123-143123-3
Main Authors: Lee, Kwan H., Green, Alex M., Taylor, Robert A., Sharp, David N., Turberfield, Andrew J., Brossard, Frederic S. F., Williams, David A., Briggs, G. Andrew D.
Format: Article
Language:English
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Summary:We have shown that photolithography can be used to create alignment markers on a semiconductor substrate at cryogenic temperatures. The epoxy resist SU-8 can be exposed effectively by two-photon absorption at a temperature of 4 K . By this means a spectroscopy apparatus can be used to find the positions of randomly distributed structures at low temperatures, such as In Ga As ∕ Ga As quantum dots, and mark their positions. We present a systematic study of the optical exposure parameters for cryogenic two-photon laser photolithography with SU-8.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2194311