Thermal stability of amorphous LaScO3 films on silicon

The thermal stability of amorphous LaScO3 thin films deposited by molecular-beam deposition directly on (001) Si was investigated by high-resolution transmission electron microscopy (HRTEM), transmission infrared absorption spectroscopy (IRAS), and x-ray diffraction (XRD). IRAS indicated that the as...

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Bibliographic Details
Published in:Applied physics letters 2006-08, Vol.89 (6)
Main Authors: Edge, L. F., Schlom, D. G., Rivillon, S., Chabal, Y. J., Agustin, M. P., Stemmer, S., Lee, T., Kim, M. J., Craft, H. S., Maria, J.-P., Hawley, M. E., Holländer, B., Schubert, J., Eisenbeiser, K.
Format: Article
Language:English
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Summary:The thermal stability of amorphous LaScO3 thin films deposited by molecular-beam deposition directly on (001) Si was investigated by high-resolution transmission electron microscopy (HRTEM), transmission infrared absorption spectroscopy (IRAS), and x-ray diffraction (XRD). IRAS indicated that the as-deposited films contained
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2222302