rf magnetron sputter deposition of transparent conducting Nb-doped TiO2 films on SrTiO3

rf magnetron sputtering, an established and scalable large area deposition process, is used to deposit Nb:TiO2 and Ta:TiO2 films onto (100) SrTiO3 substrates at temperatures TS ranging from room temperature to 400°C. Optical, electrical, and structural properties similar to those reported for pulsed...

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Bibliographic Details
Published in:Journal of applied physics 2007-02, Vol.101 (3)
Main Authors: Gillispie, Meagen A., van Hest, Maikel F. A. M., Dabney, Matthew S., Perkins, John D., Ginley, David S.
Format: Article
Language:English
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Summary:rf magnetron sputtering, an established and scalable large area deposition process, is used to deposit Nb:TiO2 and Ta:TiO2 films onto (100) SrTiO3 substrates at temperatures TS ranging from room temperature to 400°C. Optical, electrical, and structural properties similar to those reported for pulsed laser deposition grown films were obtained. In particular, the most conducting Ti0.85Nb0.15O2 films, grown at TS≈375°C, are epitaxially oriented anatase films with conductivity of 3000Scm−1, carrier concentration of 2.4×1021cm−3, Hall mobility of 7.6cm2V−1s−1, and optical transparency T>80% from 400to900nm. The conductivity is strongly correlated with the intensity of the anatase (004) x-ray diffraction peak.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.2434005