Hydrothermal method grown large-sized zinc oxide single crystal as fast scintillator for future extreme ultraviolet lithography

The scintillation properties of a hydrothermal method grown zinc oxide (ZnO) crystal are evaluated for extreme ultraviolet (EUV) laser excitation at 13.9 nm wavelength. The exciton emission lifetime at around 380 nm is determined to be 1.1 ns , almost identical to ultraviolet laser excitation cases....

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Bibliographic Details
Published in:Applied physics letters 2007-12, Vol.91 (23), p.231117-231117-3
Main Authors: Tanaka, Momoko, Nishikino, Masaharu, Yamatani, Hiroshi, Nagashima, Keisuke, Kimura, Toyoaki, Furukawa, Yusuke, Murakami, Hidetoshi, Saito, Shigeki, Sarukura, Nobuhiko, Nishimura, Hiroaki, Mima, Kunioki, Kagamitani, Yuji, Ehrentraut, Dirk, Fukuda, Tsuguo
Format: Article
Language:English
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Summary:The scintillation properties of a hydrothermal method grown zinc oxide (ZnO) crystal are evaluated for extreme ultraviolet (EUV) laser excitation at 13.9 nm wavelength. The exciton emission lifetime at around 380 nm is determined to be 1.1 ns , almost identical to ultraviolet laser excitation cases. This fast response time is sufficiently short for characterizing EUV lithography light sources having a few nanoseconds duration. The availability of large size ZnO crystal up to 3 in. is quite attractive for future lithography and imaging applications.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2815920