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Electronic cooling of a submicron-sized metallic beam
We demonstrate electronic cooling of a suspended AuPd island using superconductor- insulator-normal metal tunnel junctions. This was achieved by developing a simple fabrication method for reliably releasing narrow submicron-sized metal beams. The process is based on reactive ion etching and uses a c...
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Published in: | Applied physics letters 2009-02, Vol.94 (7), p.073101-073101-3 |
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Main Authors: | , , , , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | We demonstrate electronic cooling of a suspended AuPd island using superconductor-
insulator-normal metal tunnel junctions. This was achieved by developing a simple fabrication method for reliably releasing narrow submicron-sized metal beams. The process is based on reactive ion etching and uses a conducting substrate to avoid charge-up damage and is compatible with, e.g., conventional e-beam lithography, shadow-angle metal deposition, and oxide tunnel junctions. The devices function well and exhibit clear cooling, up to a factor of 2 at sub-Kelvin temperatures. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.3080668 |