Out-of-plane thermal diffusivity measurement of transparent thin film by the acoustic grating excitation

The theory of pulsed photoacoustic phase method for out-of-plane thermal diffusivity measurement of thin dielectric film deposited on highly absorbing substrate is developed. The method is based on spatial modulation of the intensity of excitation. Optical detection of acoustic waves enables working...

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Published in:Journal of applied physics 2009-06, Vol.105 (11), p.113107-113107-6
Main Authors: Ivakin, E. V., Karelin, M. U., Sukhadolau, A. V.
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Language:English
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description The theory of pulsed photoacoustic phase method for out-of-plane thermal diffusivity measurement of thin dielectric film deposited on highly absorbing substrate is developed. The method is based on spatial modulation of the intensity of excitation. Optical detection of acoustic waves enables working with acoustic frequencies higher than 10 7   Hz and allows characterization of transparent films of submicron thickness. Pilot measurements have been carried out with SiO 2 films on monocrystalline silicon wafer. Thermal diffusivity determined in the experiment agrees with the reference value for the bulk fused quartz.
doi_str_mv 10.1063/1.3131662
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title Out-of-plane thermal diffusivity measurement of transparent thin film by the acoustic grating excitation
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