Phonon-coupled trap-assisted charge injection in metal-nitride-oxide-silicon/silicon-oxide-nitride-oxide-silicon structures

A phonon-coupled trap model is proposed for trap-assisted injection mechanism in silicon-oxide-nitride-oxide-silicon (SONOS)/metal-nitride-oxide-silicon (MNOS) structures at low voltages. On the basis of this model, a theory of charge injection in SONOS/MNOS has been developed. Charge injection expe...

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Bibliographic Details
Published in:Journal of applied physics 2009-06, Vol.105 (12), p.123709-123709-6
Main Authors: Nasyrov, K. A., Shaimeev, S. S., Gritsenko, V. A., Han, J. H.
Format: Article
Language:English
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Summary:A phonon-coupled trap model is proposed for trap-assisted injection mechanism in silicon-oxide-nitride-oxide-silicon (SONOS)/metal-nitride-oxide-silicon (MNOS) structures at low voltages. On the basis of this model, a theory of charge injection in SONOS/MNOS has been developed. Charge injection experimental data was fitted by this theory. Obtained trap parameters are close to those previously reported [ K. A. Nasyrov , J. Appl. Phys. 96 , 4293 ( 2004 ) ], where the current dependence on temperature and electric field was investigated in MNOS.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.3151711