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Structural and electrical properties of ZnO nanorods and Ti buffer layers
Vertically-well-aligned ZnO nanorods were synthesized on Ti buffer layers by a metal-organic chemical-vapor deposition process. Structural analyses demonstrated that the ZnO nanorods were well-aligned in the c -axis and a b -plane. Transmission electron microscopy (TEM) showed that the Ti buffer lay...
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Published in: | Applied physics letters 2010-02, Vol.96 (5), p.051908-051908-3 |
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container_end_page | 051908-3 |
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container_start_page | 051908 |
container_title | Applied physics letters |
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creator | Kwak, C.-H. Kim, B.-H. Park, C.-I. Seo, S.-Y. Kim, S.-H. Han, S.-W. |
description | Vertically-well-aligned ZnO nanorods were synthesized on Ti buffer layers by a metal-organic chemical-vapor deposition process. Structural analyses demonstrated that the ZnO nanorods were well-aligned in the
c
-axis and
a
b
-plane. Transmission electron microscopy (TEM) showed that the Ti buffer layer was amorphous and interdiffused into the ZnO nanorods. Energy-dispersive spectroscopy (EDS) analysis revealed the Ti buffer layers to be slightly oxide. Extended x-ray absorption fine structure confirmed the TEM and EDS results. The I-V characteristic measurements showed a 20-fold increase in current density with the Ti buffer layer, suggesting excellent electrical contact between the Ti buffer layer and ZnO nanorods. |
doi_str_mv | 10.1063/1.3308498 |
format | article |
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c
-axis and
a
b
-plane. Transmission electron microscopy (TEM) showed that the Ti buffer layer was amorphous and interdiffused into the ZnO nanorods. Energy-dispersive spectroscopy (EDS) analysis revealed the Ti buffer layers to be slightly oxide. Extended x-ray absorption fine structure confirmed the TEM and EDS results. The I-V characteristic measurements showed a 20-fold increase in current density with the Ti buffer layer, suggesting excellent electrical contact between the Ti buffer layer and ZnO nanorods.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.3308498</identifier><identifier>CODEN: APPLAB</identifier><language>eng</language><publisher>American Institute of Physics</publisher><ispartof>Applied physics letters, 2010-02, Vol.96 (5), p.051908-051908-3</ispartof><rights>2010 American Institute of Physics</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c319t-5f77fcb48e4ca7f45b41d0ffdc929c2fa6de4b81f8c3290e872d862532c482de3</citedby><cites>FETCH-LOGICAL-c319t-5f77fcb48e4ca7f45b41d0ffdc929c2fa6de4b81f8c3290e872d862532c482de3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://pubs.aip.org/apl/article-lookup/doi/10.1063/1.3308498$$EHTML$$P50$$Gscitation$$H</linktohtml><link.rule.ids>314,778,780,782,793,27907,27908,76134</link.rule.ids></links><search><creatorcontrib>Kwak, C.-H.</creatorcontrib><creatorcontrib>Kim, B.-H.</creatorcontrib><creatorcontrib>Park, C.-I.</creatorcontrib><creatorcontrib>Seo, S.-Y.</creatorcontrib><creatorcontrib>Kim, S.-H.</creatorcontrib><creatorcontrib>Han, S.-W.</creatorcontrib><title>Structural and electrical properties of ZnO nanorods and Ti buffer layers</title><title>Applied physics letters</title><description>Vertically-well-aligned ZnO nanorods were synthesized on Ti buffer layers by a metal-organic chemical-vapor deposition process. Structural analyses demonstrated that the ZnO nanorods were well-aligned in the
c
-axis and
a
b
-plane. Transmission electron microscopy (TEM) showed that the Ti buffer layer was amorphous and interdiffused into the ZnO nanorods. Energy-dispersive spectroscopy (EDS) analysis revealed the Ti buffer layers to be slightly oxide. Extended x-ray absorption fine structure confirmed the TEM and EDS results. The I-V characteristic measurements showed a 20-fold increase in current density with the Ti buffer layer, suggesting excellent electrical contact between the Ti buffer layer and ZnO nanorods.</description><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><recordid>eNp1kMtKAzEARYMoOFYX_kG2LqbmNZNkI0jRWih0Yd24CZk8IDJOhiSz6N87tgVXri4XDhfuAeAeoyVGLX3ES0qRYFJcgAojzmuKsbgEFUKI1q1s8DW4yflrrg2htAKb95ImU6ake6gHC13vTEnBzHVMcXSpBJdh9PBz2MFBDzFFm4_kPsBu8t4l2OuDS_kWXHndZ3d3zgX4eH3Zr97q7W69WT1va0OxLHXjOfemY8Ixo7lnTcewRd5bI4k0xOvWOtYJ7IWhRCInOLGiJQ0lhgliHV2Ah9OuSTHn5LwaU_jW6aAwUr8OFFZnBzP7dGKzCUWXEIf_4T8Rar6njiLoDzw_ZK8</recordid><startdate>20100201</startdate><enddate>20100201</enddate><creator>Kwak, C.-H.</creator><creator>Kim, B.-H.</creator><creator>Park, C.-I.</creator><creator>Seo, S.-Y.</creator><creator>Kim, S.-H.</creator><creator>Han, S.-W.</creator><general>American Institute of Physics</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20100201</creationdate><title>Structural and electrical properties of ZnO nanorods and Ti buffer layers</title><author>Kwak, C.-H. ; Kim, B.-H. ; Park, C.-I. ; Seo, S.-Y. ; Kim, S.-H. ; Han, S.-W.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c319t-5f77fcb48e4ca7f45b41d0ffdc929c2fa6de4b81f8c3290e872d862532c482de3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kwak, C.-H.</creatorcontrib><creatorcontrib>Kim, B.-H.</creatorcontrib><creatorcontrib>Park, C.-I.</creatorcontrib><creatorcontrib>Seo, S.-Y.</creatorcontrib><creatorcontrib>Kim, S.-H.</creatorcontrib><creatorcontrib>Han, S.-W.</creatorcontrib><collection>CrossRef</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kwak, C.-H.</au><au>Kim, B.-H.</au><au>Park, C.-I.</au><au>Seo, S.-Y.</au><au>Kim, S.-H.</au><au>Han, S.-W.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Structural and electrical properties of ZnO nanorods and Ti buffer layers</atitle><jtitle>Applied physics letters</jtitle><date>2010-02-01</date><risdate>2010</risdate><volume>96</volume><issue>5</issue><spage>051908</spage><epage>051908-3</epage><pages>051908-051908-3</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><coden>APPLAB</coden><abstract>Vertically-well-aligned ZnO nanorods were synthesized on Ti buffer layers by a metal-organic chemical-vapor deposition process. Structural analyses demonstrated that the ZnO nanorods were well-aligned in the
c
-axis and
a
b
-plane. Transmission electron microscopy (TEM) showed that the Ti buffer layer was amorphous and interdiffused into the ZnO nanorods. Energy-dispersive spectroscopy (EDS) analysis revealed the Ti buffer layers to be slightly oxide. Extended x-ray absorption fine structure confirmed the TEM and EDS results. The I-V characteristic measurements showed a 20-fold increase in current density with the Ti buffer layer, suggesting excellent electrical contact between the Ti buffer layer and ZnO nanorods.</abstract><pub>American Institute of Physics</pub><doi>10.1063/1.3308498</doi><oa>free_for_read</oa></addata></record> |
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title | Structural and electrical properties of ZnO nanorods and Ti buffer layers |
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