Plasma enhanced chemical vapor deposition of wear resistant gradual a-Si1−x:Cx:H coatings on nickel-titanium for biomedical applications

Plasma enhanced chemical vapor deposition has been used to deposit thin films with gradual transitions from silicon to carbon on Cu, Ni, stainless steel, and NiTi. Thus show low stress, elasticity, and wear resistance with excellent adhesion on all metals under investigation. Already at low Si conce...

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Bibliographic Details
Published in:Journal of applied physics 2010-03, Vol.107 (5)
Main Authors: Niermann, Benedikt, Böke, Marc, Schauer, Janine-Christina, Winter, Jörg
Format: Article
Language:English
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Summary:Plasma enhanced chemical vapor deposition has been used to deposit thin films with gradual transitions from silicon to carbon on Cu, Ni, stainless steel, and NiTi. Thus show low stress, elasticity, and wear resistance with excellent adhesion on all metals under investigation. Already at low Si concentrations of 10 at. % the intrinsic stress is considerably reduced compared to pure diamondlike carbon (DLC) films. The deposition process is controlled by optical emission spectroscopy. This technique has been applied to monitor the growth precursors and to correlate them with the film composition. The compositions of the films were determined by Rutherford backscattering spectroscopy and XPS measurements. Due to the elastic properties of the gradual transition and the excellent biocompatibility of DLC, the described film systems present a useful coating for biomedical applications.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.3310641