Microwave properties of GdFe2:H3 films

Ferromagnetic resonance (FMR) fields and linewidths of amorphous GdFe2:H3 films have been measured for temperatures from 6 to 500 K at x band. A special procedure was devised in order to introduce and maintain hydrogen gas in films of GdFe2. Magnetometer measurements were performed on the same films...

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Bibliographic Details
Published in:Journal of applied physics 1984-01, Vol.55 (6), p.2450-2451
Main Authors: VITTORIA, C, SCHELLENG, J. H, LUBITZ, P, FORESTER, D. W
Format: Article
Language:English
Subjects:
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Ferromagnetic, antiferromagnetic, and ferrimagnetic resonances
spin-wave resonance
Magnetic resonances and relaxations in condensed matter, mössbauer effect
Materials science
Metals, semimetals and alloys
Physics
Specific materials
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Summary:Ferromagnetic resonance (FMR) fields and linewidths of amorphous GdFe2:H3 films have been measured for temperatures from 6 to 500 K at x band. A special procedure was devised in order to introduce and maintain hydrogen gas in films of GdFe2. Magnetometer measurements were performed on the same films. We find that for GdFe2:H3 the magnetization goes through a compensation point near T=300 K and the Neel temperature is 450 compared to 500 K for unhydrided GdFe2. The g factor obeys the Wangsness relation as a function of temperature. The FMR linewidth ΔH is proportional to 1/M except for 20
ISSN:0021-8979
1089-7550
DOI:10.1063/1.333691