Effects of ambient atmosphere on the transfer characteristics and gate-bias stress stability of amorphous indium-gallium-zinc oxide thin-film transistors

We investigated the transfer characteristics and the gate-bias stability of amorphous indium-gallium-zinc oxide thin-film transistors when the channel layer was exposed to hydrogen, oxygen, air, or vacuum at room temperature during measurements. The threshold voltage and the drain current were chang...

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Bibliographic Details
Published in:Applied physics letters 2010-03, Vol.96 (10)
Main Authors: Sung, Sang-Yun, Choi, Jun Hyuk, Han, Un Bin, Lee, Ki Chang, Lee, Joon-Hyung, Kim, Jeong-Joo, Lim, Wantae, Pearton, S. J., Norton, D. P., Heo, Young-Woo
Format: Article
Language:English
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Summary:We investigated the transfer characteristics and the gate-bias stability of amorphous indium-gallium-zinc oxide thin-film transistors when the channel layer was exposed to hydrogen, oxygen, air, or vacuum at room temperature during measurements. The threshold voltage and the drain current were changed by the ambient atmospheres. The threshold voltage shift (ΔVth) under gate-bias stress was faster in hydrogen than in oxygen and vacuum. It is suggested that hydrogen exposure degrades the gate-bias stress stability due to surface accumulation layer creation. The characteristic trapping times, τ, in H2, O2, air, and vacuum were 5×103, 1.5×104, 2×104, and 6.3×104 s, respectively.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.3357431