Real-time characterization of the photoresist/substrate interface

The use of a piezoelectric crystal as the substrate for a photoresist film provides unique resist characterization capabilities. In particular, the photoresist near the substrate is probed in real time. The basis of this measurement technique is described, emphasizing the physical phenomena responsi...

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Bibliographic Details
Published in:Journal of applied physics 1986-05, Vol.59 (10), p.3328-3331
Main Authors: HAGER, H. E, ESCOBAR, G. A, VERGE, P. D
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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Description
Summary:The use of a piezoelectric crystal as the substrate for a photoresist film provides unique resist characterization capabilities. In particular, the photoresist near the substrate is probed in real time. The basis of this measurement technique is described, emphasizing the physical phenomena responsible for observed piezoelectric crystal response behavior. Demonstration of this analysis to a gelatin-based resist is given. The influence of solvent drying is readily distinguishable from the effects of photohardening reactions.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.336849