Evolution of microstructure and related properties of PbZr0.4Ti0.6O3 films on F-doped tin oxide with annealing temperature

PbZr 0.4 Ti 0.6 O 3 films were fabricated on glass slices coated with a layer of F-doped transparent conductive tin oxide layer by chemical solution deposition. The evolution of microstructures and related properties of the PbZr0.4Ti0.6O3 films with annealing temperature were studied. The films show...

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Bibliographic Details
Published in:Journal of applied physics 2010-04, Vol.107 (8)
Main Authors: Zhang, T., Hu, G. J., Bu, H. J., Wu, J., Chu, J. H., Dai, N.
Format: Article
Language:English
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Summary:PbZr 0.4 Ti 0.6 O 3 films were fabricated on glass slices coated with a layer of F-doped transparent conductive tin oxide layer by chemical solution deposition. The evolution of microstructures and related properties of the PbZr0.4Ti0.6O3 films with annealing temperature were studied. The films show a perovskite phase and a crack-free surface morphology. The films annealed at >550 °C display a distinguishable layered structure consisting of dense and porous PbZr0.4Ti0.6O3 layers. The sample treated at 650 °C exhibits the largest average remanent polarization of 29.2 μC/cm2 and peak reflectivity of 95% among the films. 650 °C appears to be the best processing condition for the growth of PbZr0.4Ti0.6O3 multilayers with excellent ferroelectric and optical properties on F-doped tin oxide thin films.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.3388013