Interfacial reactions on annealing molybdenum-silicon multilayers

The structure and interfacial reaction in sputtered Mo-Si multilayers have been studied using cross-section transmission electron microscopy, electron diffraction, Rutherford backscattering, and low-angle x-ray diffraction. Low-temperature (T

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Bibliographic Details
Published in:Journal of applied physics 1989-01, Vol.65 (2), p.474-480
Main Authors: HOLLOWAY, K, KHIEM BA DO, SINCLAIR, R
Format: Article
Language:English
Subjects:
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties
Physics
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
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Description
Summary:The structure and interfacial reaction in sputtered Mo-Si multilayers have been studied using cross-section transmission electron microscopy, electron diffraction, Rutherford backscattering, and low-angle x-ray diffraction. Low-temperature (T
ISSN:0021-8979
1089-7550
DOI:10.1063/1.343425