Proton stitching of layers of SiO2 particles to fused silica

Irradiation with 100-keV protons to doses of 2.3×1015–7.6×1016 H/cm2 enhanced the adhesion and abrasion resistance of 220-nm-thick antireflective, optical coatings on fused silica substrates without adversely affecting the optical transmission and laser-damage threshold for 1064-nm photons. The as-d...

Full description

Saved in:
Bibliographic Details
Published in:Journal of applied physics 1989-11, Vol.66 (10), p.5115-5118
Main Authors: MUSKET, R. G, THOMAS, I. M
Format: Article
Language:English
Subjects:
Applied sciences
Building materials. Ceramics. Glasses
Chemical industry and chemicals
Exact sciences and technology
Glasses
Structure, analysis, properties
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Irradiation with 100-keV protons to doses of 2.3×1015–7.6×1016 H/cm2 enhanced the adhesion and abrasion resistance of 220-nm-thick antireflective, optical coatings on fused silica substrates without adversely affecting the optical transmission and laser-damage threshold for 1064-nm photons. The as-deposited, sol-gel coatings consisted of porous layers of uniform, spherical silica particles having diameters of either 8 or 20 nm. The proton doses required for significant improvements in adhesion and abrasion resistance increased with particle diameter and decreased slightly for coatings precleaned by exposure to ultraviolet radiation in the presence of reactive gases.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.343746