Isotopic exchange in hard amorphous carbonized layers

Hard amorphous films of a-C:H and a-C:D were deposited by a rf glow discharge in either CH4 or CD4 . By ion bombardment with protons and deuterons, the H/D exchange process was studied as function of the bombardment fluence by means of depth profile measurements. The local hydrogen and deuterium con...

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Bibliographic Details
Published in:Journal of applied physics 1990-01, Vol.67 (1), p.163-168
Main Authors: Boutard, D., Möller, W., Scherzer, B. M. U.
Format: Article
Language:English
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Summary:Hard amorphous films of a-C:H and a-C:D were deposited by a rf glow discharge in either CH4 or CD4 . By ion bombardment with protons and deuterons, the H/D exchange process was studied as function of the bombardment fluence by means of depth profile measurements. The local hydrogen and deuterium contents are not adding up to a constant ‘‘saturation’’ value: the local mixing model is not valid. Instead of that an initial depletion appears, which depends on the incident energy of the ions. At higher fluences, the total (H+D):C ratio tends to increase again, due to an increasing influence of the deposition process. This demonstrates a structural difference between a-C:H films and hydrogen-saturated layers of implanted carbon.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.345296