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Self-alignment of silicon chips on wafers: A capillary approach
As the limits of Moore's law are approached, three-dimensional integration appears as the key to advanced microelectronic systems. Die-to-wafer assembly appears to be an unavoidable step to reach full integration. While robotic methods experience difficulties to accommodate fabrication speed an...
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Published in: | Journal of applied physics 2010-09, Vol.108 (5), p.054905-054905-10 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | As the limits of Moore's law are approached, three-dimensional integration appears as the key to advanced microelectronic systems. Die-to-wafer assembly appears to be an unavoidable step to reach full integration. While robotic methods experience difficulties to accommodate fabrication speed and alignment accuracy, self-assembly methods are promising due to their parallel aspect, which overcomes the main difficulties of current techniques. The aim of this work is the understanding of the mechanisms of self-alignment with an evaporating droplet technique. Stable and unstable modes are examined. Causes for misalignments of chips on wafers and their evolution are investigated with the help of the
SURFACE EVOLVER
numerical software. Precautions for suitable alignment are proposed. |
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ISSN: | 0021-8979 1089-7550 |
DOI: | 10.1063/1.3466782 |