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High pressure stability of bismuth sillenite: A Raman spectroscopic and x-ray diffraction study
High pressure behavior of the compound Bi12SiO20 is investigated using in situ Raman spectroscopic and synchrotron-based angle dispersive x-ray diffraction techniques. Results indicate that the compound remains stable in the ambient pressure cubic structure up to 26 GPa. From the structural studies,...
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Published in: | Journal of applied physics 2010-10, Vol.108 (8) |
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Main Authors: | , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | High pressure behavior of the compound Bi12SiO20 is investigated using in situ Raman spectroscopic and synchrotron-based angle dispersive x-ray diffraction techniques. Results indicate that the compound remains stable in the ambient pressure cubic structure up to 26 GPa. From the structural studies, bulk modulus B0, and its pressure derivative B′ of Bi12SiO20 are evaluated to be 36 GPa and 16.7 GPa, respectively. Mode Grüneissen parameters of various Raman active modes of Bi12SiO20 are also reported. The stability of Bi12SiO20 at high pressure is discussed in the light of the pressure-induced amorphization reported in bismuth-orthosilicate (Bi4Si3O12) and -orthogermanate. Comparison of the observed phonon behavior with that reported for Bi4Si3O12 reveals that two of the Raman modes in Bi4Si3O12 have negative pressure dependencies clearly indicating dynamic instability while Bi12SiO20 does not show any signatures of zone-center instabilities. |
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ISSN: | 0021-8979 1089-7550 |
DOI: | 10.1063/1.3496659 |