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Specific resistivity of delta-doped contacts in n-GaAs
Specific contact resistivities of nonalloyed Si delta-doped contacts to n-GaAs have been measured using six-terminal Kelvin test structures. The results indicate that multiple near-surface delta layers are needed to obtain ohmic contacts with resistivities of about 10−5 Ω cm2. Lower resistivity valu...
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Published in: | Journal of applied physics 1991-07, Vol.70 (1), p.514-516 |
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container_title | Journal of applied physics |
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creator | MARCY, D. L MABY, E. W NEWMAN, P. G KHANNA, R |
description | Specific contact resistivities of nonalloyed Si delta-doped contacts to n-GaAs have been measured using six-terminal Kelvin test structures. The results indicate that multiple near-surface delta layers are needed to obtain ohmic contacts with resistivities of about 10−5 Ω cm2. Lower resistivity values may be possible if the Si donor incorporation limit can be increased above 3×1019 cm−3 through improved growth conditions. Delta-layer effectiveness is degraded by process conditions that feature a Si3N4 overlayer. |
doi_str_mv | 10.1063/1.350264 |
format | article |
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G</creatorcontrib><creatorcontrib>KHANNA, R</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Journal of applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>MARCY, D. L</au><au>MABY, E. W</au><au>NEWMAN, P. G</au><au>KHANNA, R</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Specific resistivity of delta-doped contacts in n-GaAs</atitle><jtitle>Journal of applied physics</jtitle><date>1991-07-01</date><risdate>1991</risdate><volume>70</volume><issue>1</issue><spage>514</spage><epage>516</epage><pages>514-516</pages><issn>0021-8979</issn><eissn>1089-7550</eissn><coden>JAPIAU</coden><abstract>Specific contact resistivities of nonalloyed Si delta-doped contacts to n-GaAs have been measured using six-terminal Kelvin test structures. The results indicate that multiple near-surface delta layers are needed to obtain ohmic contacts with resistivities of about 10−5 Ω cm2. Lower resistivity values may be possible if the Si donor incorporation limit can be increased above 3×1019 cm−3 through improved growth conditions. Delta-layer effectiveness is degraded by process conditions that feature a Si3N4 overlayer.</abstract><cop>Woodbury, NY</cop><pub>American Institute of Physics</pub><doi>10.1063/1.350264</doi><tpages>3</tpages></addata></record> |
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subjects | Condensed matter: electronic structure, electrical, magnetic, and optical properties Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Exact sciences and technology Physics Surface and interface electron states |
title | Specific resistivity of delta-doped contacts in n-GaAs |
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