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Kinetic-energy distributions of ions sampled from argon plasmas in a parallel-plate, radio-frequency reference cell
Kinetic-energy distributions are presented for ions sampled from 13.56-MHz discharges in argon in a capacitively-coupled, parallel-plate, Gaseous Electronics Conference (GEC) radio-frequency reference cell. The cell was modified to allow sampling of ions through an orifice in the grounded electrode....
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Published in: | Journal of applied physics 1994-01, Vol.75 (1), p.115-125 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Kinetic-energy distributions are presented for ions sampled from 13.56-MHz discharges in argon in a capacitively-coupled, parallel-plate, Gaseous Electronics Conference (GEC) radio-frequency reference cell. The cell was modified to allow sampling of ions through an orifice in the grounded electrode. Kinetic-energy distributions are presented for Ar+, Ar++, Ar+2, ArH+, and several trace ions for plasma pressures ranging from 1.3 Pa, where ion-atom collisions in the plasma sheath are not important, to 33.3 Pa, where collisions are important. Applied peak-to-peak radio-frequency (rf) voltages of 50, 100, and 200 V were used, and the current and voltage waveforms at the powered electrode were measured. Dependences of the ion fluxes, mean energies, and kinetic-energy distributions on gas pressure and applied rf voltage are interpreted in terms of possible ion-collision processes. The results agree with previously measured kinetic-energy distributions of ions sampled from the side of the plasma through a grounded probe for similar discharge conditions, verifying that ion kinetics are characteristic of the plasma sheath independent of where it is formed [J. K. Olthoff, R. J. Van Brunt, and S. B. Radovanov, J. Appl. Phys. 72, 4566 (1992)]. |
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ISSN: | 0021-8979 1089-7550 |
DOI: | 10.1063/1.355898 |