Recovery of electric resistance degraded by electromigration

• Published in: Journal of applied physics 1995-09, Vol.78 (6), p.3769-3775
• Main Authors: Ohfuji, Shin-ichi, Tsukada, Mitsuo
• Format: Article
• Language: English
• ISSN: 0021-8979; 1089-7550
• DOI: 10.1063/1.359956

Electric resistance degraded by electromigration at low temperatures is investigated by sweeping temperatures up to 400 K at a constant rate. Recovery (decrease) of the resistance is found and a first-order reaction model is applied to evaluate the activation energy spectra for this recovery. The energy spectra are found to broaden up to 1.1 eV. A comparison of the spectra with both the activation energy for the motion of vacancies and the spectra for as-deposited films prepared by electron-beam evaporation and dc sputtering indicates that the recovery comprises multienergy processes. The relaxation of mechanical stress gradients built up during the dc stress tests, the relief of microstructural changes by bulk diffusion involving the cooperative motion of large groups of atoms, and the formation of vacancy–hydrogen complexes as intermediates are discussed as possible factors contributing to the broad activation energy spectra of the recovery.