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High-resolution x-ray diffractometry of ZnTe layers at elevated temperatures
A high-temperature multicrystal x-ray diffractometer is used for measurement of elastic constants c11, c12 and the thermal-expansion coefficient of a heteroepitaxial ZnTe layer grown on a (001) oriented GaAs substrate. In addition to the standard double-crystal measurement, a new triple-crystal meth...
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Published in: | Journal of applied physics 1995-07, Vol.78 (2), p.862-867 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | A high-temperature multicrystal x-ray diffractometer is used for measurement of elastic constants c11, c12 and the thermal-expansion coefficient of a heteroepitaxial ZnTe layer grown on a (001) oriented GaAs substrate. In addition to the standard double-crystal measurement, a new triple-crystal method is proposed. This method eliminates the angular instabilities of the high-temperature goniometer and bending of the substrate. The new method was used for determination of the thermal-expansion coefficient of a GaAs substrate. As a result of detailed discussion, the optimal experimental conditions are proposed for the limitation of the errors. |
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ISSN: | 0021-8979 1089-7550 |
DOI: | 10.1063/1.360276 |