Tetrahedral amorphous carbon films prepared by magnetron sputtering and dc ion plating

Highly tetrahedral, dense amorphous carbon (ta-C) films have been deposited using rf sputtering of graphite by an unbalanced magnetron with intense dc Ar-ion plating at low temperatures (

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Bibliographic Details
Published in:Journal of applied physics 1996-02, Vol.79 (3), p.1416-1422
Main Authors: Schwan, J., Ulrich, S., Roth, H., Ehrhardt, H., Silva, S. R. P., Robertson, J., Samlenski, R., Brenn, R.
Format: Article
Language:English
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Description
Summary:Highly tetrahedral, dense amorphous carbon (ta-C) films have been deposited using rf sputtering of graphite by an unbalanced magnetron with intense dc Ar-ion plating at low temperatures (
ISSN:0021-8979
1089-7550
DOI:10.1063/1.360979