Electron spin resonance of pulsed plasma-enhanced chemical vapor deposited fluorocarbon films

Pulsed-rf excitation of hexafluoropropylene oxide has been used to deposit poly(tetrafluoroethylene)-like thin films. Films were deposited at pulse rates of 10/20, 10/50, 10/200, and 10/400 ms on/ms off and analyzed using electron spin resonance spectroscopy (ESR). All four films produced similar br...

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Bibliographic Details
Published in:Journal of applied physics 1997-08, Vol.82 (4), p.1784-1787
Main Authors: Labelle, Catherine B., Limb, Scott J., Gleason, Karen K.
Format: Article
Language:English
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Summary:Pulsed-rf excitation of hexafluoropropylene oxide has been used to deposit poly(tetrafluoroethylene)-like thin films. Films were deposited at pulse rates of 10/20, 10/50, 10/200, and 10/400 ms on/ms off and analyzed using electron spin resonance spectroscopy (ESR). All four films produced similar broad ESR spectra, with an average width at maximum slope of ∼60 G and a g value of 2.0045. The number of free electrons in a sample decreased with increasing pulse off time. This behavior can be modeled by the reaction of a free radical with a gas species, assuming that free radicals are generated only during the pulse on time.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.365980