Thermal expansion coefficients of low-k dielectric films from Fourier analysis of x-ray reflectivity

We determine the thermal expansion coefficient of a fluorinated poly(arylene ether) low-k dielectric film using Fourier analysis of x-ray reflectivity data. The approach is similar to that used in Fourier analysis of x-ray absorption fine structure. The analysis compares two similar samples, or the...

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Bibliographic Details
Published in:Journal of applied physics 2000-07, Vol.88 (2), p.691-695
Main Authors: Bouldin, C. E., Wallace, W. E., Lynn, G. W., Roth, S. C., Wu, W. L.
Format: Article
Language:English
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Summary:We determine the thermal expansion coefficient of a fluorinated poly(arylene ether) low-k dielectric film using Fourier analysis of x-ray reflectivity data. The approach is similar to that used in Fourier analysis of x-ray absorption fine structure. The analysis compares two similar samples, or the same sample as an external parameter is varied, and determines the change in film thickness. The analysis process is very accurate and depends on no assumed model. We determine a thermal expansion coefficient of 55±9×10−6 K−1 using this approach.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.373722