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Pulse fluence dependent nanograting inscription on the surface of fused silica
Pulse fluence dependent nanograting inscription on the surface of fused silica is investigated. The nanograting period is found to decrease with the increase of the incident pulse fluence. Local intensity distribution and incubation effect are responsible for the change of the nanograting period.
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Published in: | Applied physics letters 2012-06, Vol.100 (25) |
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Language: | English |
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container_title | Applied physics letters |
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creator | Liang, Feng Vallée, Réal Leang Chin, See |
description | Pulse fluence dependent nanograting inscription on the surface of fused silica is investigated. The nanograting period is found to decrease with the increase of the incident pulse fluence. Local intensity distribution and incubation effect are responsible for the change of the nanograting period. |
doi_str_mv | 10.1063/1.4729620 |
format | article |
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language | eng |
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source | American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list); AIP Journals (American Institute of Physics) |
title | Pulse fluence dependent nanograting inscription on the surface of fused silica |
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