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Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al 2 O 3 dielectric
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Published in: | Applied physics letters 2013-04, Vol.102 (17), p.173501 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.4801979 |