Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al 2 O 3 dielectric

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Published in:Applied physics letters 2013-04, Vol.102 (17), p.173501
Main Authors: Kozen, Alexander C., Schroeder, Marshall A., Osborn, Kevin D., Lobb, C. J., Rubloff, Gary W.
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Language:English
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cited_by cdi_FETCH-LOGICAL-c749-5b6488dac6f96b8fa83b9f9fa2477aac5974244ac23b2db071010e39add0bdb23
cites cdi_FETCH-LOGICAL-c749-5b6488dac6f96b8fa83b9f9fa2477aac5974244ac23b2db071010e39add0bdb23
container_end_page
container_issue 17
container_start_page 173501
container_title Applied physics letters
container_volume 102
creator Kozen, Alexander C.
Schroeder, Marshall A.
Osborn, Kevin D.
Lobb, C. J.
Rubloff, Gary W.
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doi_str_mv 10.1063/1.4801979
format article
fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1063_1_4801979</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1063_1_4801979</sourcerecordid><originalsourceid>FETCH-LOGICAL-c749-5b6488dac6f96b8fa83b9f9fa2477aac5974244ac23b2db071010e39add0bdb23</originalsourceid><addsrcrecordid>eNo1UMlqwzAQFaWFpmkP_YO59uBUsmzLOoaQLhDIJXcz2hIV2Q6SA80P9TvruOlpeDsMIc-MLhit-CtbFDVlUsgbMmNUiIwzVt-SGaWUZ5Us2T15SOlrhGXO-Yz8rL-x9Z3v9jAcLMQ-WOgdHM4m9nvbge8m3garh-g1Bjja6PrYYqcn52hIfjiBQ3XRB2ugtQOGzHfpFHDoYzZhGOMBzzYmOKXLHHYwqq3XMNFg7LEfm8b8MkAOW-Bg_P_uI7lzGJJ9ut452b2td6uPbLN9_1wtN5kWhcxKVRV1bVBXTlaqdlhzJZ10mBdCIOpSiiIvCtQ5V7lRVDDKqOUSjaHKqJzPyctfrY59StG65hh9i_HcMNpc_tuw5vpf_gurWXBt</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al 2 O 3 dielectric</title><source>American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list)</source><source>AIP_美国物理联合会现刊（与NSTL共建）</source><creator>Kozen, Alexander C. ; Schroeder, Marshall A. ; Osborn, Kevin D. ; Lobb, C. J. ; Rubloff, Gary W.</creator><creatorcontrib>Kozen, Alexander C. ; Schroeder, Marshall A. ; Osborn, Kevin D. ; Lobb, C. J. ; Rubloff, Gary W.</creatorcontrib><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.4801979</identifier><language>eng</language><ispartof>Applied physics letters, 2013-04, Vol.102 (17), p.173501</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c749-5b6488dac6f96b8fa83b9f9fa2477aac5974244ac23b2db071010e39add0bdb23</citedby><cites>FETCH-LOGICAL-c749-5b6488dac6f96b8fa83b9f9fa2477aac5974244ac23b2db071010e39add0bdb23</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,782,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Kozen, Alexander C.</creatorcontrib><creatorcontrib>Schroeder, Marshall A.</creatorcontrib><creatorcontrib>Osborn, Kevin D.</creatorcontrib><creatorcontrib>Lobb, C. J.</creatorcontrib><creatorcontrib>Rubloff, Gary W.</creatorcontrib><title>Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al 2 O 3 dielectric</title><title>Applied physics letters</title><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2013</creationdate><recordtype>article</recordtype><recordid>eNo1UMlqwzAQFaWFpmkP_YO59uBUsmzLOoaQLhDIJXcz2hIV2Q6SA80P9TvruOlpeDsMIc-MLhit-CtbFDVlUsgbMmNUiIwzVt-SGaWUZ5Us2T15SOlrhGXO-Yz8rL-x9Z3v9jAcLMQ-WOgdHM4m9nvbge8m3garh-g1Bjja6PrYYqcn52hIfjiBQ3XRB2ugtQOGzHfpFHDoYzZhGOMBzzYmOKXLHHYwqq3XMNFg7LEfm8b8MkAOW-Bg_P_uI7lzGJJ9ut452b2td6uPbLN9_1wtN5kWhcxKVRV1bVBXTlaqdlhzJZ10mBdCIOpSiiIvCtQ5V7lRVDDKqOUSjaHKqJzPyctfrY59StG65hh9i_HcMNpc_tuw5vpf_gurWXBt</recordid><startdate>20130429</startdate><enddate>20130429</enddate><creator>Kozen, Alexander C.</creator><creator>Schroeder, Marshall A.</creator><creator>Osborn, Kevin D.</creator><creator>Lobb, C. J.</creator><creator>Rubloff, Gary W.</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20130429</creationdate><title>Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al 2 O 3 dielectric</title><author>Kozen, Alexander C. ; Schroeder, Marshall A. ; Osborn, Kevin D. ; Lobb, C. J. ; Rubloff, Gary W.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c749-5b6488dac6f96b8fa83b9f9fa2477aac5974244ac23b2db071010e39add0bdb23</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2013</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kozen, Alexander C.</creatorcontrib><creatorcontrib>Schroeder, Marshall A.</creatorcontrib><creatorcontrib>Osborn, Kevin D.</creatorcontrib><creatorcontrib>Lobb, C. J.</creatorcontrib><creatorcontrib>Rubloff, Gary W.</creatorcontrib><collection>CrossRef</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kozen, Alexander C.</au><au>Schroeder, Marshall A.</au><au>Osborn, Kevin D.</au><au>Lobb, C. J.</au><au>Rubloff, Gary W.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al 2 O 3 dielectric</atitle><jtitle>Applied physics letters</jtitle><date>2013-04-29</date><risdate>2013</risdate><volume>102</volume><issue>17</issue><spage>173501</spage><pages>173501-</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><doi>10.1063/1.4801979</doi></addata></record>
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1077-3118
language eng
recordid cdi_crossref_primary_10_1063_1_4801979
source American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list); AIP_美国物理联合会现刊（与NSTL共建）
title Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al 2 O 3 dielectric
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-27T18%3A40%3A56IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Examining%20the%20role%20of%20hydrogen%20in%20the%20electrical%20performance%20of%20in%20situ%20fabricated%20metal-insulator-metal%20trilayers%20using%20an%20atomic%20layer%20deposited%20Al%202%20O%203%20dielectric&rft.jtitle=Applied%20physics%20letters&rft.au=Kozen,%20Alexander%20C.&rft.date=2013-04-29&rft.volume=102&rft.issue=17&rft.spage=173501&rft.pages=173501-&rft.issn=0003-6951&rft.eissn=1077-3118&rft_id=info:doi/10.1063/1.4801979&rft_dat=%3Ccrossref%3E10_1063_1_4801979%3C/crossref%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c749-5b6488dac6f96b8fa83b9f9fa2477aac5974244ac23b2db071010e39add0bdb23%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true